中國6月全社會用電量同比 3.7%，前值6.9%。

Al Jazeera reported Iranian officials said a U.S. artillery strike of three shells hit a bottled-water plant, damaging equipment but causing no reported casualties.

ASML said on Tuesday Intel has decided to use ASML’s next-generation high-numerical-aperture (high-NA) EUV lithography to produce parts of its flagship Panther Lake laptop processors. ASML said Intel began trials in 2024 and has started using the high-NA tool to pattern specific wafer layers. The high-NA machine costs about $400m, roughly double a standard EUV, and its deployment in production is technically challenging. ASML said the tests will help Intel and ASML collect data and more effectively build application experience for the equipment.