Market sources say Zhongji Xuchuang's $7 bln Hong Kong listing plan is reportedly close to approval.

ASML said on Tuesday Intel has decided to use ASML’s next-generation high-numerical-aperture (high-NA) EUV lithography to produce parts of its flagship Panther Lake laptop processors. ASML said Intel began trials in 2024 and has started using the high-NA tool to pattern specific wafer layers. The high-NA machine costs about $400m, roughly double a standard EUV, and its deployment in production is technically challenging. ASML said the tests will help Intel and ASML collect data and more effectively build application experience for the equipment.

阿斯麥(ASML.O)：計劃在2026年約65臺低數值孔徑（Low-NA）EUV光刻機產能的基礎上，於2027年增加30%的產能；同時，公司正在研究於2028年再增加30%產能的可行性。