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9月7日,滬深兩市總成交額爲1.95萬億,較前交易一日回落,爲連續第十三個交易日保持在20日均線(2.10萬億)下方。 -------- 注:兩市成交量反映了各大機構、遊資、廣大散戶對A股看法,高於均線代表總成交量升高,市場情緒偏樂觀,低於均線代表總成交量下降,市場情緒降溫。
2026-09-08
9月7日,滬深兩市總成交額爲1.95萬億,較前交易一日回落,爲連續第十三個交易日保持在20日均線(2.10萬億)下方。 -------- 注:兩市成交量反映了各大機構、遊資、廣大散戶對A股看法,高於均線代表總成交量升高,市場情緒偏樂觀,低於均線代表總成交量下降,市場情緒降溫。
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2026-09-08
Japan 40-year bond yield fell 6.5 bps intraday to 4.025%.
Japan 40-year bond yield fell 6.5 bps intraday to 4.025%.
2026-09-08
Samsung Electronics said it will expand cooperation with Dutch equipment maker ASML to introduce High NA EUV lithography into advanced DRAM production by 2028, its first use of High NA in DRAM mass production. High NA EUV raises numerical aperture from 0.33 to 0.55, improving resolution and reducing multi‑exposure steps versus current EUV, which can simplify process flow and enable further scaling. Samsung will validate process conditions, yields and productivity on advanced DRAM products to sec
Samsung Electronics said it will expand cooperation with Dutch equipment maker ASML to introduce High NA EUV lithography into advanced DRAM production by 2028, its first use of High NA in DRAM mass production. High NA EUV raises numerical aperture from 0.33 to 0.55, improving resolution and reducing multi‑exposure steps versus current EUV, which can simplify process flow and enable further scaling. Samsung will validate process conditions, yields and productivity on advanced DRAM products to secure key scaling technology and accelerate High NA EUV adoption in volume manufacturing.
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