U.S. Department of Justice: We will release the documents as soon as possible, but due to the large amount of material, the process may take several more weeks.

Disclaimer: ASPIRE is not responsible for the content of any analysis, advice, comment, suggestion, research report or market data in this website and links to third-party websites or resources. All the information mentioned above only represents the view of corresponding author. ASPIRE cannot and does not warrant the accuracy, validity, timeliness or completeness of any such information. You should conduct individual assessments and other proper research to make their investment decisions. The materials and information contained in this website are provided for reference only and do not constitute or form an offer, invitation, solicitation or investment advice or recommendation to acquire or dispose of any investment products or services. The price of any financial instruments described in this website may fall as well as rise. Past performance should not be taken as an indication of future performance. The risk disclosure statements do not purport to disclose or discuss all of the risks and other significant aspects of any financial instruments mentioned in this website. You should make your own appraisal of the risk and should consult to the extent necessary your own legal, tax, financial or other professional advisers in respect of any financial instruments mentioned in this website prior to entering into any transaction.

Risk Warning: Leveraged Precious Metals trading on margin carries significant risks and is not suitable for all investors. Please be sure to make investments within your own tolerance after fully understand the risks involved.

Registered & Business Address: Room 1905-1906, 19/F, Eastern Commercial Centre, 395-399 Hennessy Road, Hong Kong

Aspire Global Company Limited is not available to provide services for the residents of certain jurisdictions such as Afghanistan, the United States of America, the Islamic Republic of Iran, North Korean.