ASML (ASML.O): Plans to increase capacity by 30% in 2027, based on the existing capacity of approximately 65 Low-Aperture (Low-NA) EUV lithography machines in 2026; at the same time, the company is studying the feasibility of increasing capacity by a

2026-07-15

ASML (ASML.O): Plans to increase capacity by 30% in 2027, based on the existing capacity of approximately 65 Low-Aperture (Low-NA) EUV lithography machines in 2026; at the same time, the company is studying the feasibility of increasing capacity by another 30% in 2028.