ASML said on Tuesday Intel has decided to use ASML’s next-generation
high-numerical-aperture (high-NA) EUV lithography to produce parts of its
flagship Panther Lake laptop processors. ASML said Intel began trials in 2024
and has started using the high-NA tool to pattern specific wafer layers. The
high-NA machine costs about $400m, roughly double a standard EUV, and its
deployment in production is technically challenging. ASML said the tests will
help Intel and ASML collect data and more effectively build application
experience for the equipment.