ASML said on Tuesday Intel has decided to use ASML’s next-generation high-numerical-aperture (high-NA) EUV lithography to produce parts of its flagship Panther Lake laptop processors. ASML said Intel began trials in 2024 and has started using the hig

2026-07-15

ASML said on Tuesday Intel has decided to use ASML’s next-generation high-numerical-aperture (high-NA) EUV lithography to produce parts of its flagship Panther Lake laptop processors. ASML said Intel began trials in 2024 and has started using the high-NA tool to pattern specific wafer layers. The high-NA machine costs about $400m, roughly double a standard EUV, and its deployment in production is technically challenging. ASML said the tests will help Intel and ASML collect data and more effectively build application experience for the equipment.