Zhongwei said cumulative shipments of its advanced thin‑film equipment have exceeded 500 reaction chambers, covering core models including low‑pressure chemical vapor deposition (LPCVD), metal film deposition (MDP) and dielectric film deposition (DDP

2026-08-25

Zhongwei said cumulative shipments of its advanced thin‑film equipment have exceeded 500 reaction chambers, covering core models including low‑pressure chemical vapor deposition (LPCVD), metal film deposition (MDP) and dielectric film deposition (DDP). The company said the milestone reflects scaled commercial deployment in high‑end thin‑film deposition and that the thin‑film equipment business has become an additional core growth pillar.