Jiejia Weichuang subsidiary Chuangwei Microelectronics (Changzhou) has developed a photomask cleaning system that has passed validation at multiple end fabs and entered volume production and delivery. The equipment meets advanced-process requirements for particle control, no watermarks and surface cleanliness; the product matrix covers 5–9in quartz photomasks, supports fully automated front- and back-side cleaning, optional AOI particle inspection and SMIF automated load/unload. Key components a

2026-07-29

Jiejia Weichuang subsidiary Chuangwei Microelectronics (Changzhou) has developed a photomask cleaning system that has passed validation at multiple end fabs and entered volume production and delivery. The equipment meets advanced-process requirements for particle control, no watermarks and surface cleanliness; the product matrix covers 5–9in quartz photomasks, supports fully automated front- and back-side cleaning, optional AOI particle inspection and SMIF automated load/unload. Key components are over 80% domestically sourced and software is fully self-developed.