Jiejia Weichuang subsidiary Chuangwei Microelectronics (Changzhou) has developed
a photomask cleaning system that has passed validation at multiple end fabs and
entered volume production and delivery. The equipment meets advanced-process
requirements for particle control, no watermarks and surface cleanliness; the
product matrix covers 5–9in quartz photomasks, supports fully automated front-
and back-side cleaning, optional AOI particle inspection and SMIF automated
load/unload. Key components are over 80% domestically sourced and software is
fully self-developed.