At a Sep 7 media day, Pasini CEO Xu Jincheng said the company added a new shareholder in August — a global consumer-electronics semiconductor giant with valuation in the trillions — but he did not identify the investor and did not confirm Samsung. Xu said Pasini is working with Foxconn on production-line data collection; phone manufacturing presents larger demand. He added that automation in phone factories is already high, but end-line inspection and packaging remain labor intensive, and as hum

以色列國防軍：以色列國防軍與以色列安全局拆除了三個武器儲存設施和一個發射坑，該發射坑在整個戰爭期間被用於向以色列領土發射火箭彈。

Samsung Electronics will partner with ASML to co-develop High-NA extreme ultraviolet (EUV) lithography mask blanks, Seoul Economic Daily reports. The collaboration targets an industry shift from 6‑inch to 12‑inch mask blanks used since the 1980s; Samsung aims to be first to establish DRAM mass production on High‑NA EUV and plans to deploy the technology in DRAM from 2028. Samsung also intends to extend High‑NA EUV to 1.4nm advanced logic to support foundry expansion. High‑NA EUV offers a numerical aperture roughly 66% higher than conventional EUV, enabling finer circuit patterning; replacing 6‑inch masks with 12‑inch blanks is intended to raise fab throughput and reduce chip manufacturing costs.