The Ministry of Industry and Information Technology and China State Planner
jointly issued the Electronics Information Manufacturing ‘15th Five‑Year’ plan,
directing micro‑nano processing platform development to advance photonics R&D
and production. The plan calls for manufacturing platforms for 6‑inch and larger
compound semiconductors, 8‑inch and larger opto‑MEMS, and 12‑inch and larger
micro‑nano optical metasurfaces; it also prioritizes an optoelectronic
integration process platform to scale low‑cost, large‑volume silicon photonics
on 8‑inch wafers, boost multi‑material heterogeneous integration, and resolve
multi‑dimensional heterogeneous integration technical barriers for 12‑inch
advanced processes.
