The Ministry of Industry and Information Technology and China State Planner
jointly issued the Electronics Information Manufacturing ‘15th Five‑Year’ plan,
directing micro‑nano processing platform development to advance photonics R&D
and production. The plan calls for manufacturing platforms for 6‑inch and larger
compound semiconductors, 8‑inch and larger opto‑MEMS, and 12‑inch and larger
micro‑nano optical metasurfaces; it also prioritizes an optoelectronic
integration process platform to scale low‑cost, large‑volume silicon photonics
on 8‑inch wafers, boost multi‑material heterogeneous integration, and resolve
multi-dimensional heterogeneous integration technical barriers for 12-inch
advanced processes.